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1. | Burn-out mask: A mask of solid areas to protect portions of a previously exposed plate when exposing a second time to eliminate unwanted work. |
| 消版用遮片:它是整片实地,遮盖印版首次曝光后需要保留的部份。再次曝光,就把不要的印纹消去。 |
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2. | Surprint: Exposure of a second image on an already exposed image. See Overprinting. |
| 套晒:在已曝光的影像上,再次曝光,加上另一影像的情况。 |
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3. | time of exposure |
| 曝光时间;曝光时刻 |
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4. | Exposure chart |
| 曝光曲线 |
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5. | Exposure,radiographic exposure |
| 曝光,射线照相曝光 |
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6. | bracket exposures |
| 包围式曝光,作多级增减曝光 |
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7. | Halation: This is the result of light passing through the light sensitive emulsion,then through the film base,and finally being reflected back from the other side of the film and re-exposing the emulsion,but in a different place from the original one. |
| 光晕:光线穿过感光药膜到菲林片基而反射,使 药膜再次曝光。因反射曝光与原本曝光的位置不同,故造成光晕。 |
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8. | vertical exposure |
| 垂直曝光 |
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9. | double-exposure hologram |
| 二次曝光全息图;双曝光全息图 |
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10. | full wafer exposure |
| 整片曝光 |
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